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Virtual Lab: Minilab ? Lithography
University of Virginia
             
 
© 2003-Present, John C. Bean
 
The wafer is then rinsed in deionized water. De-ionized water is very pure water, cleaned by reverse osmosis and ion exchange to remove essentially all non-water ions and impurities.

The next process step is "etching" which transfers the photoresist pattern to the oxide below.

You can view the etch page by clicking HERE.

Or you can move to any other Minilab process page by going to the "Related Pages" button above.

 
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