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© 2003-Present, John C. Bean |
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Here close-up images of the EUV beam at the mask (upper right) and at the wafer (lower left) are shown.
The wide EUV beam scans across the entire mask but bounces only where the mask is covered by patterned reflective areas.
The portions of the beam that reflect carry the pattern information, transferring it to a photosensitive coating on the wafer.
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