We Can Figure This Out.org
Virtual Lab: EUV Lithography
University of Virginia
             
 
© 2003-Present, John C. Bean
 
Portions of the light reflected off the mask pass through the projection system consisting of four curved mirrors.

The light is reflected off the four mirrors, reducing the size of the image and focusing the image onto the silicon wafer.

The pattern on the mask is thus transferred onto the silicon substrate by this reflected light.

 
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