EUV stands for Extreme Ultra Violet. This lithographic technique uses wavelengths of light so short that they will not pass through glasses. This means that lenses cannot be used to form and reduce images.
Instead, the optical system consists entirely of curved mirrors. Further, to reflect (rather than scatter) this very short wavelength light, the mirrors must be smooth to essentially atomic dimensions. The prototype is being built at the Lawrence Livermore Labs.
Click "Next Scene" to start this tour.
Also see the "Related Pages" on our website.