We Can Figure This Out.org
Virtual Lab: Minilab ? Oxidation
University of Virginia
             
 
© 2003-Present, John C. Bean
 
The boat is slowly pushed into the furnace using the pushrod. This slow, start-and-stop movement ensures that the wafers heat uniformly. If this is not done, the wafers will heat unevenly and their non-uniform expansion can lead to stresses so large that it will actually damage the crystal structure of the Si.

The boat stops in the central "sweet-zone of the furnace where the temperature is most uniform and well controlled. Typical oxidation temperatures exceed 1000°C.

 
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