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Virtual Lab: Minilab – Wet Etching Bench
University of Virginia
             
 
© 2003-Present, John C. Bean
 
The HF bath is followed by three water baths and a water spray rinse. The reason for this sequence is that HF is a dangerous acid that attacks nerve tissue. By guiding the wand along this track, the multiple water rinses will safely purge the HF before the wafer is removed from the bench.
 
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