We Can Figure This Out.org
Virtual Lab: Making an Integrated Circuit (IC)
 University of Virginia
             
 
© 2003-Present, John C. Bean
 
Mask #2 for poly Si patterning:

A photographic emulsion is applied.

Portions of emulsion are exposed to UV light projecting thru a shadow mask.

Where UV light strikes the emulsion it breaks molecular bonds.

The regions of weakened emulsion are removed by solvent.

 
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