We Can Figure This Out.org
Virtual Lab: Making an Integrated Circuit (IC)
 University of Virginia
             
 
© 2003-Present, John C. Bean
 
Mask #1 for Si3N4 patterning:

A photographic emulsion is applied.

Portions of emulsion are exposed to UV light projecting through a shadow mask.

Where UV light strikes the emulsion it breaks molecular bonds.

The regions of weakened emulsion are removed by a solvent.




(Click here to learn more about this micro photographic technique of patterning integrated circuits)
 
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